Pritzker School of Molecular Engineering
Published January 15, 2019 | Version v1
Patent Open

Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure

Creators

  • 1. Tokyo Ohka Kogyo Co. Ltd.
  • 2. University of Chicago

Contributors

Description

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.

Files

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Additional details

Identifiers

Patent number
US 10179866 B2
Patent application number
US 201615047468 A
Other
oai:uchicago.tind.io:6973

Dates

Patent filed
2016-02-18

UChicago Information

Division(s)
Pritzker School of Molecular Engineering