Published August 24, 2017
| Version v1
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RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
Creators
- 1. Tokyo Ohka Kogyo Co. Ltd.
- 2. University of Chicago
Contributors
Patent applicants:
Description
A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being −4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.
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Additional details
Identifiers
- Patent application number
- US 201615185899 A
- Patent number
- US 9914847 B2
- Other
- oai:uchicago.tind.io:7922
Dates
- Patent filed
-
2016-02-18