Published August 27, 2015 | Version v1
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SOLVENT ANNEALING OF BLOCK COPOLYMER FILMS UNDER SUPER-SATURATED ATMOSPHERES

Description

In one embodiment, a system for solvent annealing of a block copolymer film includes a solvent annealing chamber, and a controller configured to control at least one processing parameter for inducing a super-saturation of a solvent in an atmosphere within the solvent annealing chamber. In another embodiment, a method for solvent annealing of a block copolymer film includes inducing a super-saturation of a solvent in an atmosphere within a solvent annealing chamber having a block copolymer film therein for inducing formation of polymeric domains.

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Additional details

Identifiers

Patent application number
US 201414187071 A
Patent number
US 2015/0239184 A1
Other
oai:uchicago.tind.io:8595

Dates

Patent filed
2014-02-21

UChicago Information

Division(s)
Pritzker School of Molecular Engineering