Published December 21, 2017
| Version v1
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RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
Creators
- 1. Tokyo Ohka Kogyo Co. Ltd.
- 2. University of Chicago
Contributors
Patent applicants:
Description
A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X″ represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y″ and Z″ each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R″ represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.
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Additional details
Identifiers
- Patent application number
- US 201615047520 A
- Patent number
- US 9828519 B2
- Other
- oai:uchicago.tind.io:7921
Dates
- Patent filed
-
2016-06-17