Published August 27, 2015
| Version v1
Patent
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SOLVENT ANNEALING OF BLOCK COPOLYMER FILMS UNDER SUPER-SATURATED ATMOSPHERES
Creators
- 1. Western Digital
- 2. University of Chicago
Contributors
Patent applicants:
Patent assignees:
Description
In one embodiment, a system for solvent annealing of a block copolymer film includes a solvent annealing chamber, and a controller configured to control at least one processing parameter for inducing a super-saturation of a solvent in an atmosphere within the solvent annealing chamber. In another embodiment, a method for solvent annealing of a block copolymer film includes inducing a super-saturation of a solvent in an atmosphere within a solvent annealing chamber having a block copolymer film therein for inducing formation of polymeric domains.
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US20140202546.pdf
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Additional details
Identifiers
- Patent number
- US 201414184312 A
- Patent application number
- US 2015/0239184 A1
- Other
- oai:uchicago.tind.io:7861
Dates
- Patent filed
-
2014-02-21