Published August 24, 2017
| Version v1
Patent
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Resin Composition for Forming a Phase-Separated Structure, and Method of Producing Structure Containing Phase-Separated Structure
Creators
- 1. Tokyo Ohka Kogyo Co. Ltd
- 2. University of Chicago
Contributors
Patent applicants:
Description
A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.
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US20170240766.pdf
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Additional details
Identifiers
- Patent number
- US 2017/0240766 A1
- Patent application number
- 201615047468
- Other
- oai:uchicago.tind.io:8115
Dates
- Patent filed
-
2016-02-18