Published September 8, 2022 | Version v1
Journal article Open

Influence of Excess Charge on Water Adsorption on the BiVO4(010) Surface

  • 1. University of Chicago
  • 2. Helmholtz-Zentrum Berlin für Materialien und Energie GmbH
  • 3. Lawrence Berkeley National Laboratory
  • 4. University of Wisconsin−Madison

Description

We present a combined computational and experimental study of the adsorption of water on the Mo-doped BiVO4(010) surface, revealing how excess electrons influence the dissociation of water and lead to hydroxyl-induced alterations of the surface electronic structure. By comparing ambient pressure resonant photoemission spectroscopy (AP-ResPES) measurements with the results of first-principles calculations, we show that the dissociation of water on the stoichiometric Mo-doped BiVO4(010) surface stabilizes the formation of a small electron polaron on the VO4 tetrahedral site and leads to an enhanced concentration of localized electronic charge at the surface. Our calculations demonstrate that the dissociated water accounts for the enhanced V4+ signal observed in ambient pressure X-ray photoelectron spectroscopy and the enhanced signal of a small electron polaron inter-band state observed in AP-ResPES measurements. For ternary oxide surfaces, which may contain oxygen vacancies in addition to other electron-donating dopants, our study reveals the importance of defects in altering the surface reactivity toward water and the concomitant water-induced modifications to the electronic structure.

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Additional details

Identifiers

DOI
10.1021/jacs.2c07501
Other
oai:uchicago.tind.io:5510

Funding

National Science Foundation
CHE-2054986
German Federal Ministry of Education and Research
BMBF project “JointLab─Grundlagen Elektrochemischer Phasengrenzen”

UChicago Information

Division(s)
Physical Sciences Division, Pritzker School of Molecular Engineering
Department(s)
Chemistry