Published March 23, 2006 | Version v1
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All diamond self-aligned thin film transistor

  • 1. Argonne National Laboratory

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Description

A substantially all diamond transistor with an electrically insulating substrate, an electrically conductive diamond layer on the substrate, and a source and a drain contact on the electrically conductive diamond layer. An electrically insulating diamond layer is in contact with the electrically conductive diamond layer, and a gate contact is on the electrically insulating diamond layer. The diamond layers may be homoepitaxial, polycrystalline, nanocrystalline or ultrananocrystalline in various combinations. A method of making a substantially all diamond self-aligned gate transistor is disclosed in which seeding and patterning can be avoided or minimized, if desired.

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Additional details

Identifiers

Patent application number
US 22670305 A
Patent number
US 2006/0060864 A1
Other
oai:uchicago.tind.io:8718

Dates

Patent filed
2005-09-13

UChicago Information

Division(s)
Physical Sciences Division
Department(s)
Physics