Published March 23, 2006
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All diamond self-aligned thin film transistor
Description
A substantially all diamond transistor with an electrically insulating substrate, an electrically conductive diamond layer on the substrate, and a source and a drain contact on the electrically conductive diamond layer. An electrically insulating diamond layer is in contact with the electrically conductive diamond layer, and a gate contact is on the electrically insulating diamond layer. The diamond layers may be homoepitaxial, polycrystalline, nanocrystalline or ultrananocrystalline in various combinations. A method of making a substantially all diamond self-aligned gate transistor is disclosed in which seeding and patterning can be avoided or minimized, if desired.
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US20060060864.pdf
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Additional details
Identifiers
- Patent application number
- US 22670305 A
- Patent number
- US 2006/0060864 A1
- Other
- oai:uchicago.tind.io:8718
Dates
- Patent filed
-
2005-09-13